A surface‐ionization method of detection of a neutral component of indium sputtering under bombardment by cluster ions | Zendy

Morozov S. N. | Zendy; Rasulev U. Kh. | Zendy

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A surface‐ionization method of detection of a neutral component of indium sputtering under bombardment by cluster ions

Author(s) -

Morozov S. N.,

Rasulev U. Kh.

Publication year - 2013

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.4911

Subject(s) - sputtering , indium , yield (engineering) , ionization , ion , cluster (spacecraft) , projectile , atomic physics , chemistry , analytical chemistry (journal) , materials science , physics , nanotechnology , thin film , metallurgy , chromatography , computer science , organic chemistry , programming language

A surface‐ionization method of measuring the total sputtering yield has been developed. The indium sputtering by Bi m + ( m = 1–7) cluster ions with energy 2–10 keV has been studied. A non‐additive increase in the total sputtering yield with the raise in the number of atoms in cluster projectiles has been found. Copyright © 2012 John Wiley & Sons, Ltd.

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