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Precise XPS depth analysis of soda–lime–silica glass surface after various treatments
Author(s) -
Yamamoto Yuichi
Publication year - 2012
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.4836
Subject(s) - sputtering , x ray photoelectron spectroscopy , soda lime glass , annealing (glass) , polishing , soda lime , lime , materials science , ion , mineralogy , silica glass , secondary ion mass spectrometry , analytical chemistry (journal) , chemical engineering , chemistry , metallurgy , thin film , composite material , nanotechnology , chromatography , organic chemistry , engineering
Ar ion sputtering is one of the most accepted techniques for depth profiling in practical XPS analysis, although this technique is known to be inadequate for quantitative analysis of glass including mobile ions such as soda–lime–silica glass. Buckminsterfullerene (C 60 ) ion sputtering has recently been recognized to suppress the composition change of glass and the degradation of organic materials. Here, C 60 ion sputtering was applied to examine the change of the compositional depth profile on soda–lime–silica glass (70.4SiO 2 , 0.9Al 2 O 3 , 7.3MgO, 7.8CaO, 13.6Na 2 O in mol%) surface in detail because of various treatments such as annealing, washing, polishing, and storage. The precise analysis revealed that the sodium profile changed variously within 30 nm depth. Copyright © 2012 John Wiley & Sons, Ltd.