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Development of resonance‐enhanced multiphoton ionization SNMS for state‐selective detection of sputtered atoms under low‐energy ion irradiation
Author(s) -
Kubota N.,
Hayashi S.
Publication year - 2011
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.3732
Subject(s) - atomic physics , ion , ionization , irradiation , chemistry , ion beam , sputtering , excited state , quadrupole mass analyzer , resonance enhanced multiphoton ionization , analytical chemistry (journal) , mass spectrometry , yield (engineering) , materials science , thin film , photoionization , physics , organic chemistry , chromatography , nuclear physics , metallurgy , nanotechnology
An instrument for a sputtered neutral mass spectrometry with a quadrupole mass spectrometer (QMS) by resonance‐enhanced multiphton ionization method is developed to study sputtered neutrals emission phenomena under ion irradiation in a low‐energy region. We have prepared a pulsed primary ion beam and an ion counting system, and have optimized the operation parameter including a sample bias, energy analyzer voltages, pulsed timing of laser and ion beam, etc. A yield ratio of the lowest‐lying excited state a 5 S 2 to the ground state a 7 S 3 for sputtered Cr atoms has been measured as a function of incident energy of Ar + and O 2 + down to 600 eV using a polycrystalline Cr sample. The yield ratio has become a constant value for the Ar + incidence, while it has exponentially increased below 1 keV for the O 2 + incidence. It is found that the internal energy distribution of sputtered Cr atoms has been significantly influenced by oxygen density at the surface. Copyright © 2011 John Wiley & Sons, Ltd.