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Depth profiling of lamella‐phase diblock copolymers using SIMS
Author(s) -
Lee Yeonhee,
Lee Jihye,
Lim Weon Cheol,
Shin Kwanwoo,
Kim KangJin
Publication year - 2011
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.3511
Subject(s) - copolymer , secondary ion mass spectrometry , lamellar structure , materials science , styrene , polystyrene , annealing (glass) , analytical chemistry (journal) , polymer chemistry , ion , chemistry , polymer , composite material , organic chemistry
The morphology from symmetric diblock copolymers of poly(styrene‐b‐propylmethacrylate) (PS‐PPrMA), where polystyrene (PS) block was perdeuterated near the copolymer/air and copolymer/substrate interfaces and in the bulk, was characterized by using time‐of‐flight secondary ion mass spectrometry (TOF‐SIMS). Elemental depth profiles measured in the negative ion mode by a Cs + primary ion beam demonstrate variations in hydrogen, deuterium, carbon, oxygen and hydrocarbons within the diblock copolymer according to the depth. The annealed deuterated poly(styrene‐b‐propylmethacrylate) (dPS‐PPrMA) copolymer samples showed a decrease in the deuterated PS secondary ion peak intensity as compared to the as‐cast samples. TOF‐SIMS depth profiling was obtained for the lamellar morphology of dPS‐PPrMA which is found to orient parallel to the surface of the substrate. This preferential orientation resulted in a periodic variation in the composition of each block that continued through the entire copolymer film with thickness of 700 and 2100 Å. Temperature‐dependent annealing studies on dPS‐PPrMA thin film on the silicon substrates were performed to investigate the lower critical ordering transition (LCOT) properties of diblock copolymers. Copyright © 2010 John Wiley & Sons, Ltd.