Premium
Retrospective sputter depth profiling using 3D mass spectral imaging
Author(s) -
Zheng Leiliang,
Wucher Andreas,
Winograd Nicholas
Publication year - 2011
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.3509
Subject(s) - sputtering , resolution (logic) , stack (abstract data type) , chemistry , image resolution , optics , analytical chemistry (journal) , materials science , physics , thin film , nanotechnology , computer science , artificial intelligence , chromatography , programming language
A molecular multilayer stack composed of alternating Langmuir‐Blodgett films was analyzed by ToF‐SIMS imaging in combination with intermediate sputter erosion using a focused C 60 + cluster ion beam. From the resulting dataset, depth profiles of any desired lateral portion of the analyzed field‐of‐view can be extracted in retrospect, allowing the influence of the gating area on the apparent depth resolution to be assessed. In a similar way, the observed degradation of depth resolution with increasing depth of the analyzed interface can be analyzed in order to determine the ‘intrinsic’ depth resolution of the method. Copyright © 2010 John Wiley & Sons, Ltd.