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Useful yields of organic molecules under dynamic SIMS cluster bombardment
Author(s) -
Gillen Greg,
Szakal Christopher,
Brewer Tim M.
Publication year - 2011
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.3484
Subject(s) - sputtering , yield (engineering) , analyte , chemistry , ion , molecule , analytical chemistry (journal) , silicon , cluster (spacecraft) , static secondary ion mass spectrometry , deposition (geology) , secondary ion mass spectrometry , ion beam , mass spectrometry , polyatomic ion , nanotechnology , thin film , materials science , environmental chemistry , organic chemistry , chromatography , sediment , computer science , metallurgy , biology , programming language , paleontology
Useful yields have been measured for a series of organic compounds using Ar + , SF 5 + and Bi 3 + primary ion bombardment under high dose (>10 13 ions/cm 2 ) SIMS sputtering conditions on both magnetic sector and ToF‐SIMS instruments. A precision inkjet deposition system was used to produce well defined arrays of microdrops on silicon with each deposit containing a known number of analyte molecules. The individual deposits were sputtered until consumed while monitoring the integrated characteristic molecular secondary ions for each analyte. The ratio of integrated counts to the number of molecules in the deposit defines the useful yield of the experiment. Measured useful yields varied from 1 × 10 −2 to less than 1 × 10 −8 depending on the compound examined, the probe beam used and the instrument configuration. Published in 2010 by John Wiley & Sons, Ltd.