Depth profiling of anodic tantalum oxide films with gold cluster ions | Zendy

Poerschke David | Zendy; Wucher Andreas | Zendy

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Depth profiling of anodic tantalum oxide films with gold cluster ions

Author(s) -

Poerschke David,

Wucher Andreas

Publication year - 2011

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.3441

Subject(s) - sputtering , ion , projectile , tantalum , amorphous solid , ionization , analytical chemistry (journal) , cluster (spacecraft) , materials science , oxide , anode , polyatomic ion , chemistry , thin film , atomic physics , nanotechnology , electrode , metallurgy , crystallography , physics , organic chemistry , chromatography , computer science , programming language

In order to investigate the merits of cluster bombardment for inorganic sputter depth profiling, thin (50‐nm) anodic Ta 2 O 5 films were analyzed by ToF‐SNMS using 25 keV Au n + projectile ions. The same focused primary ion beam was employed both for sputter erosion and (static) data acquisition. Sputtered neutral particles were postionized by means of single photon ionization using a 157 nm F 2 excimer laser. The results show that, for the amorphous films investigated here, the transition from mono‐ to polyatomic projectiles does not lead to a significant improvement of the apparent depth resolution. Copyright © 2010 John Wiley & Sons, Ltd.

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