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Optimizing C 60 incidence angle for polymer depth profiling by ToF‐SIMS
Author(s) -
Iida Shinichi,
Miyayama Takuya,
Sanada Noriaki,
Suzuki Mineharu,
Fisher Gregory L.,
Bryan Scott R.
Publication year - 2011
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.3429
Subject(s) - sputtering , polycarbonate , polymer , polystyrene , analytical chemistry (journal) , ion , secondary ion mass spectrometry , profiling (computer programming) , ion beam , angle of incidence (optics) , materials science , chemistry , optics , composite material , nanotechnology , chromatography , thin film , organic chemistry , computer science , physics , operating system
The introduction of C 60 + as a sputter ion beam for ToF‐SIMS has made it possible to acquire molecular depth profiles on a wide variety of polymers. However, previous studies have indicated that certain classes of polymers undergo sputter‐induced damage when bombarded with C 60 + that prevents obtaining stable molecular secondary ion signals as a function of depth. A number of different analytical parameters have been previously explored in attempts to improve depth profiling of these polymer classes. In this study, the effect of C 60 + incident angle on the ability to depth profile polycarbonate (PC) and polystyrene (PS) was investigated at angles from 48° to 76° with respect to the sample normal. This study indicates that the highest sputtering angle provided the best conditions for molecular depth profiling. Copyright © 2010 John Wiley & Sons, Ltd.
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