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Corrosion behavior under accelerated SO 2 corrosion tests of thin iron nitride films prepared by DIBS
Author(s) -
Marco J. F.,
Herranz T.,
Gracia M.,
Gancedo J. R.,
Moutinho F.,
Prieto P.,
Sanz J. M.
Publication year - 2010
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.3250
Subject(s) - corrosion , materials science , metallurgy , wafer , sputtering , thin film , nitride , degradation (telecommunications) , chemical engineering , composite material , nanotechnology , layer (electronics) , engineering , telecommunications , computer science
We report on the corrosion behavior of thin films, prepared by dual ion beam sputtering (DIBS), containing different concentrations of γ′‐and ε‐iron nitride phases. When deposited on Si wafers, the film containing almost equal amounts of γ′‐Fe 4 N and ε‐Fe 3− x N phases shows the highest corrosion resistance. When deposited on iron substrates, all the films show almost total chemical degradation. We attribute this to the open microporosity of the different films deposited. Copyright © 2010 John Wiley & Sons, Ltd.