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AES of thin oxide layers on a duplex stainless steel surface
Author(s) -
Mandrino Djordje,
Donik Črtomir,
Jenko Monika
Publication year - 2010
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.3212
Subject(s) - x ray photoelectron spectroscopy , auger electron spectroscopy , passivation , oxide , analytical chemistry (journal) , auger , nanometre , materials science , layer (electronics) , metallurgy , chemistry , composite material , chemical engineering , atomic physics , physics , chromatography , nuclear physics , engineering
Thin oxide layers were produced by exposing polished and ion‐sputtered duplex stainless steel surfaces to ambient conditions for 24 h. Another type of oxide layer was produced in a plasma passivation chamber. These layers were then studied using SEM and high‐resolution Auger electron spectroscopy (AES) profiling. The exposure under ambient conditions and the plasma passivation procedure produced broadly similar layers with thicknesses up to several nanometers. A stratified structure was observed for the Fe‐oxide/Cr‐oxide layers. The results were compared with those obtained in an x‐ray photoelectron spectroscopy (XPS) study of the same system. Linear least‐squares fitting was used to resolve the partially overlapping O and Cr Auger peaks at 510 and 530 eV, thus improving the accuracy of the AES depth profile. Copyright © 2010 John Wiley & Sons, Ltd.