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Comparison of properties of titanium aluminium nitride film produced by using two different types of Ti–Al target
Author(s) -
Larpkiattaworn Siriporn,
Ikeuchi Jun,
Eamchotchawalit Chutima
Publication year - 2009
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.3100
Subject(s) - materials science , microstructure , aluminium , titanium , phase (matter) , nitride , coating , thin film , metallurgy , aluminium nitride , ion plating , composite material , layer (electronics) , nanotechnology , chemistry , organic chemistry
This work aims to study the influence of two different types of Ti–Al target (sintered and melted) which have same nominal composition (50 at% Ti, 50 at% Al) on the properties of thin films coated by using arc ion plating (AIP) method. The hardness of the melted target was of higher value than that of the sintered target. The property of the film is related to the microstructure and phase analysis of both types of target that have quite different phases. Ti and Al metals were found as major phases and TiAl 2 as minor phase in the sintered target but only TiAl compound was found in the melted target. After film coating at the same operation parameters, it was found that although the phase structures of the sintered and melted targets were quite different, the coated thin films using these targets showed the same phase structure of Ti 0.5 Al 0.5 N. However, the microstructure of films coated by using the sintered target showed higher density of droplets and pores than those of film produced by using the melted target. As a result, the hardness and adhesion strength of thin film produced by using the melted target were slightly higher than those values of film produced by using the sintered target. Copyright © 2009 John Wiley & Sons, Ltd.