Effects of sputtering current on the bonding structure and mechanical properties of diamond‐like carbon films deposited by MFPUMST | Zendy

Dai H.Y. | Zendy; Jiang H. | Zendy; Zhan C.Y. | Zendy; Huang N.K. | Zendy

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Effects of sputtering current on the bonding structure and mechanical properties of diamond‐like carbon films deposited by MFPUMST

Author(s) -

Dai H.Y.,

Jiang H.,

Zhan C.Y.,

Huang N.K.

Publication year - 2009

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.3060

Subject(s) - sputtering , x ray photoelectron spectroscopy , materials science , diamond like carbon , raman spectroscopy , sputter deposition , diamond , carbon fibers , diamond cubic , analytical chemistry (journal) , composite material , thin film , chemical engineering , nanotechnology , chemistry , optics , physics , chromatography , composite number , engineering

Diamond‐like carbon (DLC) films on glass wafers were produced by middle frequency pulsed unbalanced magnetron sputtering technique (MFPUMST) at different sputtering current. The chemical bonding of carbon characterized by Raman spectroscopy and X‐ray photoelectron spectroscopy (XPS) show that the sp 3 fraction in DLC films increases with increasing sputtering current from 100 to 300 mA, and then decreases above 300 mA. Mechanical properties like nano‐hardness and elastic recovery for these films under different sputtering currents analyzed by a nano‐indentation technique show the same tendency that nano‐hardness and elastic recovery increase with increasing sputtering current from 100 to 300 mA, and then decrease with increasing sputtering current from 300 to 400 mA. These results indicate that the sp 3 fraction in the prepared DLC films is directly related to nano‐hardness and elastic recovery. The results shown above indicate that the parameter of the preparation—sputtering current has a strong influence on the bonding configuration of the deposited DLC films. The mechanism of sputtering current on the sp 3 fraction is discussed in this paper. Copyright © 2009 John Wiley & Sons, Ltd.

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