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XPS calibration study of thin‐film nickel silicides
Author(s) -
Cao Yu,
Nyborg Lars,
Jelvestam Urban
Publication year - 2009
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.3050
Subject(s) - x ray photoelectron spectroscopy , auger , nickel , annealing (glass) , thin film , materials science , analytical chemistry (journal) , argon , auger electron spectroscopy , chemical state , chemistry , atomic physics , metallurgy , nanotechnology , nuclear magnetic resonance , physics , chromatography , nuclear physics
This paper presents a systematic X‐ray photoelectron spectroscopy (XPS)study of the Ni silicides Ni 3 Si, Ni 31 Si 12 , Ni 2 Si, NiSi and NiSi 2 produced by annealing of sputtered thin films. The in situ XPS study focuses on both the core level peaks and Auger peaks. The peak positions, shapes, satellites as well as Auger parameters are compared for different silicides. The factors that influence the Ni core level peak shifts are discussed. The Ni 2p 3/2 peak shape and satellites are correlated with the valence band structure. The effect of argon ion etching on surface composition and chemical states is also investigated. Copyright © 2009 John Wiley & Sons, Ltd.