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X‐ray photoelectron spectroscopic chemical state quantification of mixed nickel metal, oxide and hydroxide systems
Author(s) -
Biesinger Mark C.,
Payne Brad P.,
Lau Leo W. M.,
Gerson Andrea,
Smart Roger St. C.
Publication year - 2009
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.3026
Subject(s) - nickel , x ray photoelectron spectroscopy , non blocking i/o , nickel oxide , analytical chemistry (journal) , hydroxide , chemical state , oxide , chemistry , spectral line , metal , inorganic chemistry , nuclear magnetic resonance , catalysis , physics , chromatography , astronomy , biochemistry , organic chemistry
Quantitative chemical state X‐ray photoelectron spectroscopic analysis of mixed nickel metal, oxide, hydroxide and oxyhydroxide systems is challenging due to the complexity of the Ni 2p peak shapes resulting from multiplet splitting, shake‐up and plasmon loss structures. Quantification of mixed nickel chemical states and the qualitative determination of low concentrations of Ni(III) species are demonstrated via an approach based on standard spectra from quality reference samples (Ni, NiO, Ni(OH) 2 , NiOOH), subtraction of these spectra, and data analysis that integrates information from the Ni 2p spectrum and the O 1s spectra. Quantification of a commercial nickel powder and a thin nickel oxide film grown at 1‐Torr O 2 and 300 °C for 20 min is demonstrated. The effect of uncertain relative sensitivity factors (e.g. Ni 2.67 ± 0.54) is discussed, as is the depth of measurement for thin film analysis based on calculated inelastic mean free paths. Copyright © 2009 John Wiley & Sons, Ltd.