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Mapping of chemical bonding states of Ag/Si(111) with synchrotron radiation photo emission electron microscopy
Author(s) -
Hashimoto M.,
Guo F.Z.,
Suzuki M.,
Ueda M.,
Matsuoka Y.,
Kinoshita T.,
Kobayashi K.,
Shin S.,
Oura M.,
Takeuchi T.,
Saito Y.,
Matsushita T.,
Yasue T.,
Koshikawa T.
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2988
Subject(s) - x ray photoelectron spectroscopy , synchrotron radiation , chemical state , photoelectric effect , binding energy , chemical bond , chemistry , chemical shift , electron , materials science , analytical chemistry (journal) , crystallography , atomic physics , optics , physics , nuclear magnetic resonance , optoelectronics , organic chemistry , quantum mechanics , chromatography
The chemical state sensitive imaging of Ag/Si (111) using Ag 3d core photoelectrons was tried using a spectroscopic photo emission and low energy electron microscopy at SPring‐8. XPS spectrum obtained from the two‐dimensional (2D) Ag/Si(111) √3 × √3 structure exhibits the chemical shift of about 0.5 eV toward the higher binding energy with respect to that from the three‐dimensional (3D) Ag(111) island with 1 × 1 structure. The direct imaging of the difference in the chemical bonding state between the 3D and 2D structure has been tried, but it was not easy because the XPS signal from the 3D island was fairly larger than that from the 2D layer. The XPEEM images relative to a reference image taken in between XPS peaks of the 3D and 2D structures made the visualization of the different chemical state possible. Copyright © 2008 John Wiley & Sons, Ltd.