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Study on dynamics of surface structure by rapid and time‐resolved X‐ray photoelectron diffraction
Author(s) -
Kisaka Y.,
Hashimoto A.,
Suzuki A.,
Miyasaka S.,
Nojima M.,
Owari M.,
Nihei Y.
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2959
Subject(s) - x ray photoelectron spectroscopy , diffraction , x ray , silicon , dynamics (music) , surface (topology) , epitaxy , analytical chemistry (journal) , materials science , chemistry , optics , nanotechnology , physics , optoelectronics , nuclear magnetic resonance , geometry , mathematics , chromatography , acoustics , layer (electronics)
It took several hours to obtain one X‐ray photoelectron diffraction (XPED) pattern because XPED measurement requires repeated acquisition of XPS as a function of emission angle. The measurement time using our previous XPED system was too long to clarify the dynamics of epitaxial growth and catalytic reaction. In the present study, in order to minimize the measurement time, we improved the software used to control the XPED system. Then, by using the improved system, we obtained information on the structural changes during the heating process of an ion‐bombarded silicon surface. Copyright © 2008 John Wiley & Sons, Ltd.