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Study on the layer structure of W/C multilayers deposited by magnetron sputtering using x‐ray reflectivity
Author(s) -
Deng Songwen,
Qi Hongji,
Shao Jianda
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2952
Subject(s) - reflectivity , layer (electronics) , sputter deposition , materials science , wavelength , cavity magnetron , x ray reflectivity , sputtering , analytical chemistry (journal) , x ray , transition layer , optics , optoelectronics , thin film , chemistry , nanotechnology , physics , chromatography
A study on the layer structure of W/C multilayers deposited by magnetron sputtering is reported. In the study, soft x‐ray resonant reflectivity and hard x‐ray grazing incidence reflectivity of the W/C multilayers were measured. The imperfections at the interface such as interdiffusion and formation of compounds were dealt with by two methods. On analyzing the experimental results, we found that the incorporation of an interlayer was a more suitable method than the traditional statistical method to describe the layer structure of a W/C system we fabricated. The optical constants of each layer at a wavelength of 4.48 nm were also obtained from the analysis. Copyright © 2008 John Wiley & Sons, Ltd.