Molecular‐level etching by electrospray droplet impact | Zendy

Sakai Yuji | Zendy; Iijima Yoshitoki | Zendy; Mori Kunihiko | Zendy; Hiraoka Kenzo | Zendy

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Molecular‐level etching by electrospray droplet impact

Author(s) -

Sakai Yuji,

Iijima Yoshitoki,

Mori Kunihiko,

Hiraoka Kenzo

Publication year - 2008

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.2946

Subject(s) - electrospray ionization , electrospray , etching (microfabrication) , chemistry , layer (electronics) , cluster (spacecraft) , sputtering , ionization , ion , matrix (chemical analysis) , analytical chemistry (journal) , chemical physics , mass spectrometry , nanotechnology , chromatography , materials science , organic chemistry , thin film , computer science , programming language

A novel ionization method, electrospray droplet impact (EDI), has been developed for matrix‐free SIMS. The charged water droplets used in EDI are extremely large cluster ions with masses of about a few 10 6 u. When the charged water droplets impact on a target, the physical sputtering of the target is suppressed to minimal and an atomic‐and molecular‐level layer‐by‐layer etching is realized. Copyright © 2008 John Wiley & Sons, Ltd.

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