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Analysis of Cu segregation to oxide–metal interface of Ni‐based alloy in a metal‐dusting environment
Author(s) -
Doi Takashi,
Kitamura Kazuyuki,
Nishiyama Yoshitaka,
Otsuka Nobuo,
Kudo Takeo,
Sato Masugu,
Ikenaga Eiji,
Ueda Shigenori,
Kobayashi Keisuke
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2910
Subject(s) - oxide , metal , corrosion , x ray photoelectron spectroscopy , alloy , synchrotron radiation , materials science , photoelectric effect , metallurgy , analytical chemistry (journal) , chemical engineering , chemistry , optoelectronics , optics , physics , chromatography , engineering
Hard X‐ray photoelectron spectroscopy (HX‐PES) has been realized using high‐brilliance synchrotron radiation. High‐energy photon excitation enables us to probe photoelectrons with larger escape depth compared to conventional PES. This allows us to conduct, without destruction, a study of the embedded interface of materials as the oxide‐ metal interface. We apply HX‐PES to investigate for Cu segregation in the oxide–metal interface during metal‐dusting corrosion. The effective concentration of Cu in the segregation was estimated a few times higher than the bulk concentration. These results on the interface layer can explain the variation in the corrosion resistance. Copyright © 2008 John Wiley & Sons, Ltd.