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Atomic‐level characterization of materials with core‐ and valence‐level photoemission: basic phenomena and future directions
Author(s) -
Fadley Charles S.
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2902
Subject(s) - x ray photoelectron spectroscopy , excitation , valence (chemistry) , characterization (materials science) , photoemission spectroscopy , diffraction , inverse photoemission spectroscopy , atomic physics , analytical chemistry (journal) , chemistry , materials science , nanotechnology , physics , optics , nuclear magnetic resonance , quantum mechanics , environmental chemistry , organic chemistry
Abstract In this overview, the basic concepts of core and valence photoelectron spectroscopy (photoemission), photoelectron diffraction, and photoelectron holography are introduced. Then some current developments in these techniques that should enhance their utility for atomic‐level characterization of new materials and surface chemical processes are discussed, including measurements with hard X‐ray excitation, standing‐wave excitation, and ambient pressures in the multi‐torr regime. Copyright © 2008 John Wiley & Sons, Ltd.