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Observation of microcontaminants on pure chromium surface by AFM and their removal by UV light illumination
Author(s) -
Wang Rongguang
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2879
Subject(s) - x ray photoelectron spectroscopy , ultraviolet , chromium , ultraviolet light , particle (ecology) , wetting , contamination , analytical chemistry (journal) , chemistry , materials science , environmental chemistry , chemical engineering , photochemistry , metallurgy , optoelectronics , composite material , ecology , oceanography , engineering , biology , geology
Microcontaminants on a pure chromium surface were observed and confirmed by atomic force microscope (AFM). On the basis of surface observation, X‐ray photoelectron spectroscopy (XPS) analysis and wettability measurement, the removal of microcontaminants by ultraviolet (UV) light illumination was investigated. Particle‐ and film‐like microcontaminants on the specimen surface were observed. With an increase in air exposure time, particle‐like contaminants increased in size, and then film‐like contaminants almost covered the entire surface. Most organic substance in the contaminants was removed by UV light illumination in a sealed chamber, except water in the contaminants. The re‐adhesion of contaminants on the UV‐light‐illuminated surface seemed slower after compared to before UV light illumination. Copyright © 2008 John Wiley & Sons, Ltd.