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X‐ray photoelectron spectroscopy of SPE‐grown bcc‐Fe, polycrystal and β‐FeSi 2 phases on Si(111) surfaces
Author(s) -
Hattori Azusa N.,
Hattori Ken,
Daimon Hiroshi
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2828
Subject(s) - x ray photoelectron spectroscopy , silicide , annealing (glass) , analytical chemistry (journal) , materials science , epitaxy , binding energy , spectroscopy , crystallography , chemistry , silicon , metallurgy , nanotechnology , nuclear magnetic resonance , atomic physics , physics , chromatography , layer (electronics) , quantum mechanics
Ultrathin films of iron silicides were grown on Si(111) surfaces by solid phase epitaxy (SPE); iron deposition and subsequent annealing, and analyzed using in situ high energy‐resolution X‐ray photoelectron spectroscopy (XPS). We analyzed peaks using Lorentzian and Donaich‐Šunjić curves and estimated the validity of both fittings. Under the sequence from bcc‐Fe to polycrystal phase (the mixture of Fe 3 Si and β‐FeSi 2 ), and then β‐FeSi 2 phase with annealing process, the slight chemical shifts of Fe 2p 3/2 toward higher binding energy (BE) and the reduction of peak asymmetry for Fe 2p 3/2 and Fe 2p 1/2 were observed. We attributed this behavior to the reduction of the metallicity in iron silicide films. Copyright © 2008 John Wiley & Sons, Ltd.