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Surface modification of polymeric thin films with vacuum ultraviolet light
Author(s) -
Sarantopoulou E.,
Kovač J.,
Kollia Z.,
Raptis I.,
Kobe S.,
Cefalas A. C.
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2776
Subject(s) - irradiation , thin film , substrate (aquarium) , materials science , photodissociation , layer (electronics) , ultraviolet , methyl methacrylate , photochemistry , surface roughness , etching (microfabrication) , chemical engineering , chemistry , polymer , composite material , polymerization , nanotechnology , optoelectronics , oceanography , physics , geology , nuclear physics , engineering
Spin‐coated poly(methyl methacrylate) (PMMA) thin films on SiO 2 substrate were chemically modified with laser light at 157 nm in nitrogen. Film changes involve bond breaking of polymeric chains, etching, and surface morphological changes. The 157 nm photons mainly dissociate the CO, CO, and CH bonds, and catalyze the formation of new CN bonds. The surface roughness of the irradiated films was changed with the formation of elongated patterns. The film thickness during irradiation was reduced with the rate of 0.005 nm at 1 mJ/cm 2 . Furthermore, the PMMA film forms a thin interface layer with the SiO 2 substrate. Its thickness was reduced following vacuum ultraviolet (VUV) irradiation due to photodissociation of molecules inside the interface layer. Copyright © 2008 John Wiley & Sons, Ltd.