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High‐energy total reflection X‐ray photoelectron spectroscopy for polished iron surface
Author(s) -
Nagoshi Masayasu,
Kawano Takashi,
Makiishi Noriko,
Baba Yuji,
Kobayashi Katsumi
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2728
Subject(s) - x ray photoelectron spectroscopy , photoelectric effect , spectral line , synchrotron radiation , photon energy , x ray , reflection (computer programming) , analytical chemistry (journal) , range (aeronautics) , chemistry , materials science , optics , photon , atomic physics , physics , nuclear magnetic resonance , chromatography , astronomy , computer science , composite material , programming language
Total reflection (TR) XPS has been applied to a mirror‐polished iron sheet using incident X‐ray with the energy range of 1800–3600 eV from synchrotron radiation. XPS spectra measured under the TR conditions show remarkably low background intensity and the relative background intensity becomes lower as the photon energy of incident X‐ray increases. These results are explained qualitatively by means of shallow penetration depth of grazing incident X‐rays and rather deep escape depth of high‐energy photoelectrons. XPS spectra have been recorded under ordinary XPS geometry using X‐rays with the same energy range. These spectra are compared with TRXPS, and background spectra are extracted and used for background subtraction for ordinary XPS spectra. Copyright © 2008 John Wiley & Sons, Ltd.