Premium
Nanoscopic distribution of potential and topography on Si (111) surface having 1 × 1 and 7 × 7 structures with and without scratching
Author(s) -
Nakayama Keiji,
Shiota Tadashi
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2714
Subject(s) - kelvin probe force microscope , nanoscopic scale , atomic force microscopy , scratching , volta potential , surface (topology) , adsorption , nanotechnology , atomic units , chemical physics , surface structure , chemistry , materials science , molecular physics , composite material , geometry , physics , mathematics , quantum mechanics
The distribution of potential has been investigated for Si (111) surfaces having 1 × 1 and 7 × 7 structures with and without scratching. It was measured using scanning Kelvin probe force microscopy combined with non‐contact atomic force microscopy in an ultrahigh vacuum. Potential images display nanoscopic structures related to surface atomic structures, so we can distinguish 1 × 1 and 7 × 7 structures and scratched surfaces even when the topographical difference is negligible. Oxygen adsorption greatly changes the surface potential and the extent of the difference depends on the surface atomic structure. Copyright © 2008 John Wiley & Sons, Ltd.