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Investigation of thin oxide films on titanium for capacitor applications
Author(s) -
Schroth S.,
Schneider M.,
Mayer Uhma T.,
Michaelis A.,
Klemm V.
Publication year - 2008
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2708
Subject(s) - materials science , amorphous solid , titanium , coulometry , transmission electron microscopy , thin film , ellipsometry , capacitor , oxide , dielectric , chemical engineering , substrate (aquarium) , titanium oxide , permittivity , composite material , electrochemistry , analytical chemistry (journal) , optoelectronics , metallurgy , nanotechnology , chemistry , crystallography , electrode , voltage , electrical engineering , oceanography , engineering , chromatography , geology
Thin passive films on titanium formed by electrolytic oxidation show a high relative permittivity and could be a promising cost effective dielectric material for capacitor applications. In the present work, the films were formed in an acetate buffer solution by potentiodynamic polarisation up to various potentials. The film thickness was determined by coulometry and ellipsometry. The growth factor is 2.7 nm/V. Furthermore, by using an electrochemical micro‐capillary cell the anodising process was performed at high lateral resolution on different substrate grains with various crystallographic orientations. An influence of the Ti grain orientation on the TiO 2 film thickness could not be observed under the used experimental conditions. By means of transmission electron microscope(TEM) investigation the oxide film structure could be determined as prevailing amorphous. Copyright © 2008 John Wiley & Sons, Ltd.