Combined IR and XPS analysis of the native (1 0 0) surface of single‐crystalline silicon after HF aq  etching | Zendy

Cerofolini G. F. | Zendy; Giussani A. | Zendy; Carone Fabiani F. | Zendy; Modelli A. | Zendy; Mascolo D. | Zendy; Ruggiero D. | Zendy; Narducci D. | Zendy; Romano E. | Zendy

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Combined IR and XPS analysis of the native (1 0 0) surface of single‐crystalline silicon after HF aq etching

Author(s) -

Cerofolini G. F.,

Giussani A.,

Carone Fabiani F.,

Modelli A.,

Mascolo D.,

Ruggiero D.,

Narducci D.,

Romano E.

Publication year - 2007

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.2599

Subject(s) - x ray photoelectron spectroscopy , silicon , etching (microfabrication) , stoichiometry , aqueous solution , analytical chemistry (journal) , infrared spectroscopy , infrared , chemistry , materials science , chemical engineering , optics , organic chemistry , physics , layer (electronics) , engineering

A combined analysis, based on angle‐resolved X‐ray photoelectron spectroscopy and multiple‐internal‐reflection infrared spectroscopy, of the (1 0 0) silicon surface after etching in dilute aqueous solution of HF is presented. The analysis shows that the surface is mainly formed by a heterogeneous distribution of SiH, SiH 2 and SiH 3 terminations, but contains (in addition to sub‐stoichiometric oxidized silicon) a form of reduced silicon, not consistent with the currently accepted picture of the native HF aq ‐etched surface. Copyright © 2007 John Wiley & Sons, Ltd.

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