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Oxidation behavior of NiAl alloy at low temperatures
Author(s) -
Ohtsu Naofumi,
Oku Masaoki,
Obara Kazuo,
Ito Shun,
Shisido Toetsu,
Wagatsuma Kazuaki
Publication year - 2007
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2558
Subject(s) - nial , x ray photoelectron spectroscopy , oxide , non blocking i/o , alloy , layer (electronics) , materials science , chemical engineering , metallurgy , analytical chemistry (journal) , chemistry , intermetallic , catalysis , composite material , organic chemistry , engineering
Oxidation behavior of NiAl alloy at low temperatures was studied. A NiAl plate was oxidized by exposure to ambient atmosphere at room temperature, heated at 473 K in air, and heated at 773 K in air. The oxide formed on the NiAl surface was investigated by angle‐resolved X‐ray photoelectron spectroscopy (AR‐XPS). Chemical composition and atomic concentration in the oxide layer were analyzed with factor analysis of XPS spectra. Exposure of the NiAl plate to the ambient atmosphere resulted in the formation of an Al 2 O 3 layer along with a small amount of NiO. Oxidation of the NiAl plate at 473 K in air formed a film of double‐layered oxide; the top layer consisted of NiAl 2 O 4 and a small amount of NiO, and the second layer was Al 2 O 3 . Successive oxidation at 773 K only changed the oxide‐layer thickness without changing the structure. Formation of oxide observed in the present study corresponds to the thermodynamic prediction for the oxidation behavior of NiAl at 1373 K. Copyright © 2007 John Wiley & Sons, Ltd.