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A quantitative method for dual‐pass electrostatic force microscopy phase measurements
Author(s) -
Yan Minjun,
Bernstein Gary H.
Publication year - 2007
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2529
Subject(s) - electrostatic force microscope , phase (matter) , signal (programming language) , electrostatics , microscopy , dual (grammatical number) , kelvin probe force microscope , finite element method , atomic force microscopy , materials science , chemistry , analytical chemistry (journal) , optics , physics , nanotechnology , computer science , thermodynamics , art , literature , organic chemistry , chromatography , programming language
Electrostatic force microscopy (EFM) has become a powerful tool for investigating charges on surfaces. The use of phase measurement in EFM is a direct and fast way to detect electrostatic force gradients, but only qualitatively. With the dual‐pass scheme, the phase signal at lifted height is often assumed to exclude any influences from the topography, but it does not. We report the collection of both topography and phase data by EFM on charged, micron‐sized metal wires. In order to quantify the electrostatic force, a cone model and finite element analysis are provided to integrate the force gradient from the phase signal. Copyright © 2007 John Wiley & Sons, Ltd.