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Intrinsic and extrinsic contributions to plasmon excitations in electron emission processes
Author(s) -
Gervasoni J. L.,
Kövér L.
Publication year - 2006
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2324
Subject(s) - electron , specular reflection , plasmon , excitation , surface plasmon , interference (communication) , condensed matter physics , dielectric , work (physics) , chemistry , atomic physics , materials science , physics , optics , optoelectronics , quantum mechanics , channel (broadcasting) , electrical engineering , engineering
In this work, we study in detail the process of excitation of bulk and surface plasmons during the emission of electrons in the proximity of a solid surface. We take into account the effects due to electron transport (extrinsic contributions) and residual hole (intrinsic contributions). We use the dielectric response theory and the specular reflection model. The results obtained for Al metal illustrate that, depending on the distance from the surface, the separation of extrinsic and intrinsic contributions could be ambiguous because of interference effects between the photoelectron and the photohole present in both processes. Copyright © 2006 John Wiley & Sons, Ltd.