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Alkali ion intercalation in V 2 O 5 : preparation and laboratory characterization of thin films produced by ALD
Author(s) -
Donsanti F.,
Kostourou K.,
Decker F.,
Ibris N.,
Salvi A. M.,
Liberatore M.,
Thissen A.,
Jaegerman W.,
Lincot D.
Publication year - 2006
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2237
Subject(s) - electrochromism , alkali metal , x ray photoelectron spectroscopy , atomic layer deposition , intercalation (chemistry) , electrochromic devices , thin film , substrate (aquarium) , electrochemistry , inorganic chemistry , materials science , ion , ionic bonding , chemistry , chemical engineering , analytical chemistry (journal) , nanotechnology , electrode , organic chemistry , oceanography , geology , engineering
Thin films of V 2 O 5 act as performant alkali ion storage material, with applications mostly in Li microbatteries or in electrochromic windows. Oxide films less than 100 nm thick have been obtained by the Atomic Layer Deposition (ALD) method. The alkali ion insertion has been performed either via an electrochemical cathodic reaction in a non‐aqueous solvent, or from the vapour phase in a vacuum chamber at RT. Both experimental procedures promoted the insertion of large amounts of the alkali ion with consequent reduction of the oxidation state of V, from 5+ to 4+ and even to 3+, measured with XPS‐UPS. The reversibility of this reaction was a function of the amount of ionic charge inserted, of the substrate used (FTO, Cr‐coated glass) and of the heat treatment adopted for the ALD film. Copyright © 2006 John Wiley & Sons, Ltd.