Premium
Deposition of ultrathin organic films on various carbon surfaces using vacuum vapor deposition
Author(s) -
Choi Junho,
Kato Takahisa,
Nakao Setsuo,
Ikeyama Masami,
Kawaguchi Masahiro
Publication year - 2006
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2229
Subject(s) - amorphous carbon , carbon film , carbon fibers , chemical vapor deposition , adsorption , deposition (geology) , chemical engineering , lubricant , chemistry , materials science , amorphous solid , thin film , inorganic chemistry , nanotechnology , organic chemistry , composite material , composite number , paleontology , sediment , engineering , biology
In this report, we describe the bonding characteristics of a model lubricant, perfluoro‐1‐decanol (P1D), having a hydroxyl end group, toward N and Si incorporated amorphous carbon surfaces. The P1D is deposited on the carbon surfaces using vacuum vapor deposition, and the P1D bonding toward the carbon surfaces is compared to that deposited by immersion, a traditional deposition method. The P1D molecules are strongly bonded to the carbon surfaces by the vacuum vapor deposition, whereas the bondings are minimal in the case of immersion. The N and Si incorporation enhances the bonding of P1D toward the carbon surfaces. This is due to the change in the surface structure of the hydrogen‐terminated carbon surfaces by N and Si incorporation into the carbon network, which increases the adsorption sites on the carbon surfaces. Copyright © 2006 John Wiley & Sons, Ltd.