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New universal expression for the electron stopping power for energies between 200 eV and 30 keV
Author(s) -
Jablonski A.,
Tanuma S.,
Powell C. J.
Publication year - 2006
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2202
Subject(s) - inelastic mean free path , stopping power , electron , atomic physics , auger electron spectroscopy , monte carlo method , electron spectroscopy , x ray photoelectron spectroscopy , chemistry , mean free path , spectroscopy , physics , ion , nuclear physics , quantum mechanics , statistics , nuclear magnetic resonance , mathematics
We report the development of a new analytical expression for the electron stopping power (SP) for electron energies between 200 eV and 30 keV. This expression describes the product of the SP and the inelastic mean free path (IMFP), and is a simple function of atomic number and electron energy. Parameters in the expression were obtained from fits to SPs and IMFPs calculated from optical data for a group of 27 elemental solids. The mean deviation of 10.4% in these fits was less than the mean deviations found in similar fits with the empirical modifications of the Bethe SP equation by Joy and Luo and by Fernandez‐Varea et al . The new expression is considered suitable for Monte Carlo simulations of electron transport with the continuous slowing‐down approximation relevant to Auger‐electron spectroscopy, X‐ray photoelectron spectroscopy, and electron‐probe microanalysis. Copyright © 2005 John Wiley & Sons, Ltd.