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Surface analyses and depth profiles of oxide scales formed on alloy surface
Author(s) -
Horita Teruhisa,
Xiong Yueping,
Kishimoto Haruo,
Yamaji Katsuhiko,
Sakai Natsuko,
Brito Manuel E.,
Yokokawa Harumi
Publication year - 2006
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2151
Subject(s) - oxide , alloy , secondary ion mass spectrometry , analytical chemistry (journal) , spinel , glow discharge , ion , chemistry , materials science , metallurgy , plasma , environmental chemistry , physics , organic chemistry , quantum mechanics
The distributions of elements were analyzed at oxide scale surface and around the oxide scale/alloy interfaces. Glow discharge optical emission spectrometry (GDOES) depth profiles and secondary ion mass spectrometry (SIMS) imaging have been applied to analyze the oxide scales formed on FeCr alloys in CH 4 H 2 O (thickness from 100 nm to 4 µm, at 1073 K for 3 to 1050 h). The oxide scale is identified as the following phases from surface to inner oxide: MnFe oxide spinel, Cr 2 O 3 oxide, SiO 2 , Al 2 O 3 inner oxide and FeCr alloy. The concentration of Si was estimated from the quantitative analysis of Si with the GDOES depth analysis. The Si concentration increases with the oxidation duration and the highest concentration after 1050 h treatment is estimated to be 4.9 mass% from the quantitative analysis of Si. Copyright © 2006 John Wiley & Sons, Ltd.