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Simulation of electron spectra for surface analysis (SESSA): a novel software tool for quantitative Auger‐electron spectroscopy and X‐ray photoelectron spectroscopy
Author(s) -
Smekal Werner,
Werner Wolfgang S. M.,
Powell Cedric J.
Publication year - 2005
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2097
Subject(s) - x ray photoelectron spectroscopy , auger electron spectroscopy , nist , spectral line , auger , analytical chemistry (journal) , electron spectroscopy , computer science , chemistry , materials science , physics , atomic physics , nuclear magnetic resonance , astronomy , chromatography , natural language processing , nuclear physics
A description of a new NIST database for quantitative Auger‐electron and X‐ray photoelectron spectroscopy (AES/XPS) is given: Simulation of Electron Spectra for Surface Analysis (SESSA). This database contains extensive sets of data for the physical quantities relevant to AES and XPS. The internal databases are linked to a user interface via a small expert system that allows a user to automatically retrieve data needed for a specific practical application. SESSA can simulate AES and XPS spectra for a multilayered thin‐film sample for measurement conditions specified by the user. Experimental information needed by SESSA is entered via an interface that matches the settings of AES/XPS instrumentation. The structure of SESSA is described together with information on special features, unique capabilities, and sources of the physical data. Examples of practical applications of SESSA for angle‐resolved XPS on Al and Si samples, determination of the depth distribution function in XPS, and the use of empirical peak shapes for spectrum simulation are given. These and other applications are contained in SESSA in the form of tutorial files with command‐language statements that can be loaded into SESSA and modified as necessary for similar simulations. Copyright © 2005 John Wiley & Sons, Ltd.