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ToF‐SIMS studies of the oxidation of Fe by D 2 O vapour: comparison with XPS
Author(s) -
Grosvenor A. P.,
Francis J. T.,
Kobe B. A.,
McIntyre N. S.
Publication year - 2005
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.2039
Subject(s) - x ray photoelectron spectroscopy , deuterium , chemistry , secondary ion mass spectrometry , oxide , analytical chemistry (journal) , hydroxide , layer (electronics) , inorganic chemistry , ion , chemical engineering , physics , organic chemistry , chromatography , quantum mechanics , engineering
The oxidation of iron (Fe) by water (D 2 O) vapour at low pressures and room temperature was investigated using time‐of‐flight (ToF) SIMS. The results supported those found previously using XPS and the QUASES ™ program in that a duplex oxide structure was found containing a thin outer surface hydroxide (Fe(OD) 2 ) layer over an inner oxide (FeO) layer. The extraordinary depth resolution of the ToF‐SIMS profiles assisted in identifying the two phases; this resolution was achieved by compensation for surface roughness. A substantial concentration of deuterium was found in the subsurface oxide layer. This observation confirmed previous assessments that the formation of FeO was from the reaction of Fe(OD) 2 with outward‐diffusing Fe, leaving deuterium as a reaction product. Copyright © 2005 John Wiley & Sons, Ltd.