ToF‐SIMS studies of the oxidation of Fe by D 2 O vapour: comparison with XPS | Zendy

Grosvenor A. P. | Zendy; Francis J. T. | Zendy; Kobe B. A. | Zendy; McIntyre N. S. | Zendy

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ToF‐SIMS studies of the oxidation of Fe by D 2 O vapour: comparison with XPS

Author(s) -

Grosvenor A. P.,

Francis J. T.,

Kobe B. A.,

McIntyre N. S.

Publication year - 2005

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.2039

Subject(s) - x ray photoelectron spectroscopy , deuterium , chemistry , secondary ion mass spectrometry , oxide , analytical chemistry (journal) , hydroxide , layer (electronics) , inorganic chemistry , ion , chemical engineering , physics , organic chemistry , chromatography , quantum mechanics , engineering

The oxidation of iron (Fe) by water (D 2 O) vapour at low pressures and room temperature was investigated using time‐of‐flight (ToF) SIMS. The results supported those found previously using XPS and the QUASES ™ program in that a duplex oxide structure was found containing a thin outer surface hydroxide (Fe(OD) 2 ) layer over an inner oxide (FeO) layer. The extraordinary depth resolution of the ToF‐SIMS profiles assisted in identifying the two phases; this resolution was achieved by compensation for surface roughness. A substantial concentration of deuterium was found in the subsurface oxide layer. This observation confirmed previous assessments that the formation of FeO was from the reaction of Fe(OD) 2 with outward‐diffusing Fe, leaving deuterium as a reaction product. Copyright © 2005 John Wiley & Sons, Ltd.

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