Multilayer mirrors for  µ ‐XPS using a Schwarzschild objective | Zendy

Takenaka Hisataka | Zendy; Ichimaru Satoshi | Zendy; Nagai Koumei | Zendy; Ohchi Tadayuki | Zendy; Ito Hisashi | Zendy; Gullikson E. M. | Zendy

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Multilayer mirrors for µ ‐XPS using a Schwarzschild objective

Author(s) -

Takenaka Hisataka,

Ichimaru Satoshi,

Nagai Koumei,

Ohchi Tadayuki,

Ito Hisashi,

Gullikson E. M.

Publication year - 2005

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.1959

Subject(s) - schwarzschild radius , x ray photoelectron spectroscopy , wavelength , photoemission spectroscopy , materials science , optics , sputter deposition , analytical chemistry (journal) , optoelectronics , sputtering , physics , thin film , chemistry , nanotechnology , nuclear magnetic resonance , astrophysics , accretion (finance) , chromatography

The development of highly reflective multilayer mirrors for use in the wavelength region around 6 nm has made it possible to use a multilayer‐coated Schwarzschild objective for micro‐x‐ray photoemission spectroscopy. For this purpose, Co x Cr 1− x /C and W/C multilayers were fabricated by magnetron sputtering and the soft x‐ray reflectivities were measured. The peak reflectivity of the Cr/C multilayer was found to be the highest with ∼18.9% at a wavelength of 6.42 nm and an incident angle of 88°. It is believed that a Cr/C multilayer will provide sufficient performance for use on a Schwarzschild mirror for x‐ray photoemission spectroscopy using 6 nm x‐rays. Copyright © 2005 John Wiley & Sons, Ltd.

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