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Multilayer mirrors for µ ‐XPS using a Schwarzschild objective
Author(s) -
Takenaka Hisataka,
Ichimaru Satoshi,
Nagai Koumei,
Ohchi Tadayuki,
Ito Hisashi,
Gullikson E. M.
Publication year - 2005
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1959
Subject(s) - schwarzschild radius , x ray photoelectron spectroscopy , wavelength , photoemission spectroscopy , materials science , optics , sputter deposition , analytical chemistry (journal) , optoelectronics , sputtering , physics , thin film , chemistry , nanotechnology , nuclear magnetic resonance , astrophysics , accretion (finance) , chromatography
The development of highly reflective multilayer mirrors for use in the wavelength region around 6 nm has made it possible to use a multilayer‐coated Schwarzschild objective for micro‐x‐ray photoemission spectroscopy. For this purpose, Co x Cr 1− x /C and W/C multilayers were fabricated by magnetron sputtering and the soft x‐ray reflectivities were measured. The peak reflectivity of the Cr/C multilayer was found to be the highest with ∼18.9% at a wavelength of 6.42 nm and an incident angle of 88°. It is believed that a Cr/C multilayer will provide sufficient performance for use on a Schwarzschild mirror for x‐ray photoemission spectroscopy using 6 nm x‐rays. Copyright © 2005 John Wiley & Sons, Ltd.