Application of metal cluster complex ion beam for low damage sputtering | Zendy

Fujimoto Toshiyuki | Zendy; Mizota Takeshi | Zendy; aka Hidehiko | Zendy; Kurokawa Akira | Zendy; Ichimura Shingo | Zendy

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Application of metal cluster complex ion beam for low damage sputtering

Author(s) -

Fujimoto Toshiyuki,

Mizota Takeshi,

aka Hidehiko,

Kurokawa Akira,

Ichimura Shingo

Publication year - 2005

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.1955

Subject(s) - cluster (spacecraft) , sputtering , metal , ionization , ion beam , atomic physics , materials science , beam (structure) , chemistry , nozzle , ion , nanotechnology , metallurgy , optics , thin film , physics , organic chemistry , computer science , programming language , thermodynamics

Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro‐spray‐like ionization using an ink‐jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater‐like hole at the carbon sheet. Copyright © 2005 John Wiley & Sons, Ltd.

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