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Application of metal cluster complex ion beam for low damage sputtering
Author(s) -
Fujimoto Toshiyuki,
Mizota Takeshi,
aka Hidehiko,
Kurokawa Akira,
Ichimura Shingo
Publication year - 2005
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1955
Subject(s) - cluster (spacecraft) , sputtering , metal , ionization , ion beam , atomic physics , materials science , beam (structure) , chemistry , nozzle , ion , nanotechnology , metallurgy , optics , thin film , physics , organic chemistry , computer science , programming language , thermodynamics
Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro‐spray‐like ionization using an ink‐jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater‐like hole at the carbon sheet. Copyright © 2005 John Wiley & Sons, Ltd.