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Surface structural analysis of monolayer films composed of light elements by x‐ray photoelectron diffraction
Author(s) -
Nakamura H.,
Fujihara N.,
Nojima M.,
Tamura K.,
Ishii H.,
Owari M.,
Oshima C.,
Nihei Y.
Publication year - 2004
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1935
Subject(s) - excited state , monolayer , diffraction , x ray photoelectron spectroscopy , x ray , chemistry , molecule , scattering , crystallography , materials science , atomic physics , optics , nanotechnology , physics , nuclear magnetic resonance , organic chemistry
For surface structural analysis on monolayer films composed of light elements, we investigated theoretical x‐ray photoelectron diffraction (XPED) patterns from single‐molecule adsorbing surfaces by using both Cr Lα (572.8 eV) and Al Kα (1486.6 eV) excitations. Forward‐scattering peaks and Kikuchi‐like bands were clearly observed in the pattern excited by Al Kα. In contrast, the features of the XPED patterns excited by Cr Lα were more diffuse. However, the circular patterns excited by Cr Lα are clearer than those excited by Al Kα. This result suggests that the use of a lower energy x‐ray source improves XPED structural analysis on ultrathin films composed of light elements. Copyright © 2004 John Wiley & Sons, Ltd.