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Highly angular resolved x‐ray photoelectron diffraction measurements from a Ge(111) surface
Author(s) -
Wakamatsu N.,
Tamura K.,
Ishii H.,
Owari M.,
Nihei Y.
Publication year - 2004
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1933
Subject(s) - angular resolution (graph drawing) , diffraction , analyser , resolution (logic) , excited state , x ray , atomic physics , electron diffraction , x ray photoelectron spectroscopy , surface (topology) , optics , chemistry , materials science , physics , nuclear magnetic resonance , geometry , mathematics , combinatorics , artificial intelligence , computer science
Using a high angle‐resolving electron energy analyser with a novel input lens system, we measured Ge 3p x‐ray photoelectron diffraction (XPED) patterns from a Ge(111) surface excited by Al Kα with changing angular resolution from ±0.04° to ±2°, and considered the angular resolution dependence of XPED patterns from experiments and theory. Highly angular resolved XPED patterns containing fine features such as Kikuchi‐like bands were obtained. These patterns were reproduced by theoretical calculations. We also performed the theoretical calculations for further investigation of highly angular resolved XPED. Copyright © 2004 John Wiley & Sons, Ltd.