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Error estimation in peak‐shape analysis of XPS core‐level spectra using UNIFIT 2003: how significant are the results of peak fits?
Author(s) -
Hesse R.,
Chassé T.,
Streubel P.,
Szargan R.
Publication year - 2004
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1925
Subject(s) - x ray photoelectron spectroscopy , spectral line , reliability (semiconductor) , basis (linear algebra) , minification , statistical error , computational physics , statistics , approximation error , algorithm , computer science , mathematics , statistical physics , nuclear magnetic resonance , mathematical optimization , physics , geometry , thermodynamics , power (physics) , astronomy
An error analysis for numerically evaluating random uncertainties in x‐ray photoelectron spectroscopy has been implemented in version 2003 of the spectra treatment and analysis software UNIFIT in order to improve the understanding of the statistical basis and the reliability of the model parameters for photoelectron spectra. The theoretical basis as well as two approaches to obtain error limits of the fit parameters have been considered. Several test spectra have been analysed and discussed. A representative example has been chosen to demonstrate the relevance of the error estimation for practical surface analysis. Suggestions for the minimization of errors in the peak‐fitting procedures are presented. Copyright © 2004 John Wiley & Sons, Ltd.