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Fast atom beam treatment of ultra‐high molecular weight polyethylene
Author(s) -
Tóth A.,
Ujvári T.,
Bertóti I.,
Szilágyi E.,
Keszthelyi T.,
Juhász A.
Publication year - 2004
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1832
Subject(s) - elastic recoil detection , x ray photoelectron spectroscopy , polyethylene , materials science , dehydrogenation , spectroscopy , atom (system on chip) , ultra high molecular weight polyethylene , rutherford backscattering spectrometry , indentation , scratch , analytical chemistry (journal) , atomic physics , chemistry , thin film , nanotechnology , nuclear magnetic resonance , composite material , biochemistry , physics , quantum mechanics , chromatography , computer science , embedded system , catalysis
Ultra‐high molecular weight polyethylene (UHMWPE) was surface treated by beams of various inert and reactive atoms in the low keV range. Sum frequency generation (SFG) spectroscopy showed the complete destruction of ordered packing at the topmost surface. Rutherford backscattering (RBS) and elastic recoil detection analysis (ERDA) revealed a strong surface dehydrogenation. Depth‐sensing nano‐indentation and nanoscratch measurements testified to alterations in the nanomechanical properties. A correlation has been established between the scratch resistance and the plasmon loss energy of the C 1s XPS peak. Copyright © 2004 John Wiley & Sons, Ltd.