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Elemental distributions around the oxide scales/alloy interfaces by SIMS and GDOES analyses
Author(s) -
Horita Teruhisa,
Xiong Yueping,
Yamaji Katsuhiko,
Kishimoto Haruo,
Sakai Natsuko,
Yokokawa Harumi
Publication year - 2004
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1815
Subject(s) - grain boundary , oxide , diffusion , alloy , layer (electronics) , analytical chemistry (journal) , chemistry , secondary ion mass spectrometry , metallurgy , materials science , microstructure , mass spectrometry , thermodynamics , physics , chromatography , organic chemistry
The oxide scales formed on FeCr alloys in CH 4 H 2 O gas mixtures (at 1073 K for 3–1050 h) were precisely analysed by SIMS and GDOES. Depth profiles were compared between SIMS and GDOES. They were almost consistent with each other with some differences in minor elements. In depth profiles, the following three zones were identified from surface to internal oxides: Mn and Fe rich layer, Cr‐rich layer, and Si‐rich layer. The elemental distributions at different depths were investigated by the SIMS imaging technique. Concentration differences of some elements at grain and grain boundaries were imaged at the resolution of µms. The grain boundary diffusion of cations in the alloys was clearly visualized, and the grain boundary diffusion plays an important role in the formation of oxide scales. Copyright © 2004 John Wiley & Sons, Ltd.