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Low‐energy and low‐dose electron irradiation of potassium–lime–silicate glass investigated by XPS. Part II. Chemical bonding
Author(s) -
Zemek J.,
Gedeon O.
Publication year - 2004
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1792
Subject(s) - x ray photoelectron spectroscopy , irradiation , potassium silicate , soda lime , analytical chemistry (journal) , oxygen , chemistry , electron beam processing , silicate , materials science , mineralogy , nuclear chemistry , chemical engineering , organic chemistry , physics , nuclear physics , engineering
XPS has been used to study changes in chemical bonding occurring in a surface region of potassium–lime–silicate glass. The surface was prepared by fracturing in ultrahigh vacuum and step‐by‐step irradiated with low‐energy and low‐dose electron beam. The modified near‐surface region thickness is in this case comparable with the mean sampling depth of XPS. Therefore, possible changes due to electron irradiation could be recorded with high sensitivity. The irradiation resulted in potassium accumulation at the glass surface. As a consequence, changes in surface charging, binding energy shift, peak width (FWHM), and peak area ratios of non‐bridging oxygen (NBO) and bridging oxygen (BO) contributions to the O 1s lines with electron dose were observed. Copyright © 2004 John Wiley & Sons, Ltd.