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The influence of surface roughness on the adhesion force
Author(s) -
Meine K.,
Kloß K.,
Schneider T.,
Spaltmann D.
Publication year - 2004
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1738
Subject(s) - wafer , adhesion , surface roughness , surface energy , cantilever , atomic force microscopy , surface (topology) , surface finish , surface force , silicon , contact area , polymer , materials science , composite material , nanotechnology , chemistry , mechanics , physics , optoelectronics , geometry , mathematics
Adhesion measurements are presented which were carried out with an atomic force microscope between polymer balls attached to a cantilever and a silicon wafer under ultra high vacuum conditions. In using a silicon surface with a defined structure a correlation between adhesion force and contact area was found. This correlation could partly be explained by the Johnson–Kendall–Roberts model, if a change of the surface energy is assumed as a result of the structuring. For a constant geometric contact area an additional structuring leads to a decrease of the adhesion force. Copyright © 2004 John Wiley & Sons, Ltd.

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