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Plasma CVD characterization of nanocarbon film growth
Author(s) -
Obraztsov A. N.,
Zolotukhin A. A.,
Ustinov A. O.,
Volkov A. P.
Publication year - 2004
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1722
Subject(s) - raman spectroscopy , carbon film , methane , carbon fibers , analytical chemistry (journal) , plasma , chemical vapor deposition , graphite , thin film , characterization (materials science) , hydrogen , gas composition , condensation , plasma enhanced chemical vapor deposition , chemical engineering , chemistry , materials science , nanotechnology , organic chemistry , composite material , optics , composite number , quantum mechanics , thermodynamics , physics , engineering
We report on the characterization of d.c. discharge plasma‐enhanced chemical vapour deposition of nanocarbon film materials in a hydrogen–methane gas mixture. The effects of the gas composition and pressure on the current–voltage characteristics and optical emission spectra of the discharge plasma are studied. By varying the parameters we obtain various carbon thin‐film materials, the structure and composition of which are characterized qualitatively by Raman spectroscopy and electron microscopy. The data obtained by optical emission spectroscopy show the presence of H, H 2 , CH and C 2 activated species in the discharge plasma. We assume that C 2 dimers play a decisive role in nanostructured graphite‐like carbon film formation and carbon condensation in the gas phase. Copyright © 2004 John Wiley & Sons, Ltd.