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Quantitative surface chemical‐state microscopy by x‐ray photoelectron spectroscopy
Author(s) -
Walton J.,
Fairley N.
Publication year - 2004
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1654
Subject(s) - x ray photoelectron spectroscopy , chemical state , silicon , analytical chemistry (journal) , sample (material) , microscopy , realization (probability) , resolution (logic) , x ray , silicon dioxide , spectroscopy , materials science , data acquisition , software , chemical species , chemistry , nanotechnology , computer science , optoelectronics , optics , physics , nuclear magnetic resonance , artificial intelligence , chromatography , mathematics , statistics , quantum mechanics , metallurgy , operating system , organic chemistry , programming language
The realization of surface chemical‐state microscopy by x‐ray photoelectron spectroscopy requires the resolution of overlapped chemical states, an adequate background description and the ability to quantify data. This can be achieved only by the acquisition and analysis of multi spectral data sets. Here we describe the software to perform this analysis, which is capable of allowing for small amounts of differential charging and for incorporation of knowledge about the sample. We demonstrate its use on a patterned silicon dioxide on silicon sample, and suggest ways to reduce oversampling and therefore acquisition times. Copyright © 2004 John Wiley & Sons, Ltd.