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Study of interface diffusion and reaction between Zr 3 N 4 and stainless steel
Author(s) -
Wang Li,
Yin Musheng,
Zhu Yongfa
Publication year - 2003
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1607
Subject(s) - annealing (glass) , materials science , analytical chemistry (journal) , scanning electron microscope , sputtering , sputter deposition , metallurgy , thin film , composite material , chemistry , nanotechnology , chromatography
The effect of annealing treatment on the interface diffusion and reaction between Zr 3 N 4 /stainless steel was studied by AES depth profiling along with line shape analysis. The Zr 3 N 4 film was deposited on stainless‐steel substrates by reactive magnetron sputtering. Scanning electron microscopy, electron diffraction, AES and UV–VIS reflection were performed to characterize the deposited film. The results indicated that the interface diffusion between Zr 3 N 4 and stainless steel took place during deposition and can be promoted by annealing treatment, but no interface reaction took place before or after annealing treatment. High‐temperature and long‐time annealing treatment resulted in obvious oxidation of the Zr 3 N 4 layer. The UV–VIS reflection results indicated that the absorption band of Zr 3 N 4 film shifted to shorter wavelength after annealing treatment. Copyright © 2003 John Wiley & Sons, Ltd.