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X‐ray reflection from thin multilayers: symmetric patterns
Author(s) -
Karimov Pavel,
Harada Shingo,
Kawai Jun
Publication year - 2003
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1497
Subject(s) - reflection (computer programming) , wafer , optics , sample (material) , total internal reflection , x ray , detector , rotation (mathematics) , silicon , thin film , materials science , physics , optoelectronics , geometry , computer science , nanotechnology , mathematics , thermodynamics , programming language
A series of experiments on x‐ray reflection from thin multilayers and films on a silicon wafer were carried out. The x‐ray source and detector were fixed and the glancing angle was changed by sample stage rotation. The use of a Geiger‐Müller counter allowed bizarre symmetric patterns to be obtained in the reflected x‐ray intensity. The origin of these patterns is not clear at the present stage of the investigation. To perform a preliminary analysis of the x‐ray reflection from multilayers, the Microsoft Access database has been developed. Copyright © 2003 John Wiley & Sons, Ltd.