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Analysis of the boundaries of ZrO 2 and HfO 2 thin films by atomic force microscopy and the combined optical method
Author(s) -
Klapetek Petr,
Ohlídal Ivan,
Franta Daniel,
Pokorný Pavel
Publication year - 2002
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1419
Subject(s) - thin film , atomic force microscopy , materials science , optical microscope , root mean square , analytical chemistry (journal) , optics , scanning electron microscope , condensed matter physics , chemistry , composite material , nanotechnology , physics , quantum mechanics , chromatography
In this paper an atomic force microscopy analysis of the microrough upper boundaries of ZrO 2 and HfO 2 thin films is presented. Within this analysis the values of the width, root‐mean‐square value of heights and power spectral density function of these boundaries are determined for ZrO 2 and HfO 2 exhibiting different thicknesses. The thickness dependences of the quantities mentioned are introduced. The values of the thicknesses of the films are evaluated using the combined optical method. This optical method is also used to describe boundary microroughness within the effective medium theory. A discussion of the results concerning the microroughness of the upper boundaries of both the ZrO 2 and HfO 2 thin films is also introduced. Copyright © 2002 John Wiley & Sons, Ltd.